The Single Best Strategy To Use For Noohapou
The Single Best Strategy To Use For Noohapou
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distant areas: Static units are typically situated remotely, raising Value and reducing In general system performance.
Instrument & TCU software calibration procedures range external take a look at tools not made use of consistently for verifying
Using the POU3500, you can obtain unparalleled brings about etch effectiveness, chamber uptime, lessened expense of possession and fab House utilization – all while website improving upon your process reliability.
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LAUDA-Noah will, for just a shopper's retrofit analysis, check and adjust its fluid temperature Command profiles to match an current TCUs' as a way to ensure a sleek method integration by using DAQ.
The accuracy in the POU 3300 allows for impartial Charge of the procedure fluid temperature to your wafer chuck in +/- 0.one °C of set level, and the fast reaction time of the procedure makes it possible for for optimum wafer-to-wafer repeatability throughout the etch procedure.
The precision of the POU 3500 permits unbiased control of the method fluid temperature to the wafer chuck inside +/- 0.1 °C of set point, and the rapidly response time on the program makes it possible for for maximum wafer-to-wafer repeatability through the etch procedure.
With our unit strategically mounted close to six ft in the chamber, we achieve a way more precise examining from the chuck temperature. This approach makes sure reliable temperature through the output lot, bringing about enhanced wafer-to-wafer CD uniformity.
significant Footprint: Static units occupy substantial space throughout the fabrication tool space, minimizing its performance.
Dynamic Temperature Regulate, as carried out in methods like the LAUDA-Noah POU, is an tactic that senses the temperature of the method fluid returning from the procedure chamber’s wafer chuck (ESC) and dynamically adjusts the temperature in the supplied method fluid determined by this genuine-time feed-back.
the information set here is from a 200mm quantity output wafer fab and clearly illustrates the advantage of the LAUDA-Noah POU procedure.
The POU3300 method offers dynamic temperature Charge of the process chamber cathode / electrode / anode and might be synchronized with any etch method.
Confirmed; TEs' symbolize only one part of a chiller's style and design. The switching & Handle techniques used by a chiller will effect the TEs' dependability.
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